T.Q. Abrasive Machining offers complete specialized quality control manufacturing of materials and capabilities
to produce sputtering targets with any and most all-exotic materials.
Many types of applications are used for applying PVD coating on metals and other materials to improve the wear
resistance of a completed sputtering target.
Best-Most Common Materials for Sputtering Targets:
Silicon nitride (Si3N4) Sputtering Targets
Silicon carbide (SiC)
Boron carbide (B4C) Sputtering Targets
Titanium diboride (TiB2)
The above list is most often selected because of their high electrical receptivity and hardness properties.
With broad technology in thin film coating and component fabrication / manufacturing we provide a variety of sputtering targets
in different structures, custom shapes, sizes, thicknesses, widths, diameters, structures and dimensions per your specifications
with purities up to 99.99% to meet most requirements and specifications.
Sputtering Targets offer superior purity, high density and excellent consistency giving long life span and excellent
capabilities.
Sputtering Target Capabilities: up to 16" diameter and 20" in length
Sputtering Target Lengths for most materials:
Single piece Maximum Length 30”
Multiple pieces much larger
Sputtering Target Thickness:
up to 16” as low as .005
Sputtering Target Widths
One solid piece 16”
Sputtering Target Diameter:
Thickness up to 16” as low as .005
Other sizes are available per customers' requirements.
T.Q Abrasive Machining maintains High Quality standards with the strictest standards in production and manufacturing
sputtering targets. Please call with your requirements.
T. Q. Abrasive Machining 3338
W. Castor Street Santa Ana, California 92704
